Title: Thin film and surface characterization by specular X-ray 
reflectivity
Author(s): Chason E, Mayer TM
Source: CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES 22 (1): 
1-67 1997
Document Type: Review
Language: English
Cited References: 206      Times Cited: 61       
Abstract: We review the use of specular X-ray reflectivity (XRR) for the 
characterization of thin-film and surface structures. Specular X-ray 
scattering at small scattering vectors allows characterization of electron 
density profiles perpendicular to the surface on the length scale of 0.1 
to 100 nm. This allows measurement of surface morphology, thin films, 
multilayer structures, and buried interfaces. The technique is 
nondestructive and can be applied in situ in a variety of processing 
environments. In the first half of the article, we review the theory and 
methods of XRR, including analysis of XRR spectra by a multilayer optical 
approach and a discussion of surface roughness measurements by XRR and 
other techniques. In the second half, we present a wide range of examples 
of XRR applications in thin-film structures, dynamic processes, liquid 
surfaces, and macromolecular structures.
Author Keywords: thin film; specular X-ray reflectivity; electron density 
profiles; surface morphology
KeyWords Plus: LIQUID-VAPOR INTERFACE; SPECTROSCOPIC IMMERSION 
ELLIPSOMETRY; LAYERED SYNTHETIC MICROSTRUCTURES; PERPENDICULAR 
MAGNETIC-ANISOTROPY; GROWTH TEMPERATURE-DEPENDENCE; 
SCANNING-TUNNELING-MICROSCOPE; GIANT-MAGNETORESISTANCE; ION-BOMBARDMENT; 
EXTREME-ULTRAVIOLET; MULTILAYER MIRRORS
Addresses: Chason E (reprint author), SANDIA NATL LABS, DEPT 1112, M51415, 
ALBUQUERQUE, NM 87185 USA
Publisher: CRC PRESS INC, 2000 CORPORATE BLVD NW, JOURNALS CUSTOMER 
SERVICE, BOCA RATON, FL 33431
Subject Category: MATERIALS SCIENCE, MULTIDISCIPLINARY; PHYSICS, CONDENSED 
MATTER
IDS Number: WR066
ISSN: 1040-8436