Computers in Physics is no longer being published. It was replaced in January 1999 by Computing in Science and Engineering.

Computers in Physics -- July 1998 -- Volume 12, Issue 4, pp. 360-370

IMD—Software for modeling the optical properties of multilayer films

David L. Windt

Bell Laboratories, Murray Hill, New Jersey 07974

(Received 9 February 1998; accepted 31 March 1998)

A computer program called IMD is described. IMD is used for modeling the optical properties (reflectance, transmittance, electric-field intensities, etc.) of multilayer films, i.e., films consisting of any number of layers of any thickness. IMD includes a full graphical user interface and affords modeling with up to eight simultaneous independent variables, as well as parameter estimation (including confidence interval generation) using nonlinear, least-squares curve fitting to user-supplied experimental optical data. The computation methods and user interface are described, and numerous examples are presented that illustrate some of IMD's unique modeling, fitting, and visualization capabilities. ©1998 American Institute of Physics.

PII: S0894-1866(98)01604-6
doi:10.1063/1.168689
PACS: 78.20.Bh, 42.79.Wc, 07.05.Tp, 02.60.Ed, 78.20.Ci, 07.05.Rm        Additional Information

References

1. See, for example, Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, New York, 1985).
   
2. IMD can be downloaded from http://www.bell-labs.com/user/windt/idl.
   
3. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54, (1993). In addition to the data contained therein, the Center For X-Ray Optics (CXRO), Lawrence Berkeley Laboratory, maintains an active database of atomic scattering factors; these data are available at http://www-cxro.lbl.gov and have been included in IMD, courtesy of E. M. Gullikson.
   
4. IDL is available from Research System, Inc., Boulder, CO, http://www.rsinc.com.
   
5. See, for example, J. D. Jackson, Classical Electrodynamics, 2nd ed. (Wiley, New York, 1975), pp. 281–282.
   
6. Note that in our definition of the Fresnel coefficients we have assumed that (a) each material is optically isotropic, and (b) the magnetic permeability is the same in both regions.
   
7. D. G. Stearns, J. Appl. Phys. 65, 491 (1989).
   
8. L. Névot and P. Croce, Rev. Phys. Appl. 15, 761 (1980). [INSPEC]
   
9. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, Oxford, 1980).
   
10. D. W. Marquardt, J. Soc. Ind. Appl. Math. 11, 431 (1963).
    
11. P. R. Bevington, Data Reduction and Error Analysis for the Physical Sciences (McGraw–Hill, New York, 1969).
    
12. M. Lampton, B. Margon, and S. Bowyer, Astrophys. J. 208, 177 (1976).
    
13. W. Cash, Astron. Astrophys. 52, 307 (1976). [INSPEC]
    
14. A periodic multilayer is defined here as a group of m layers that is repeated N times to make a stack consisting of a total of m × N layers.
    
15. Due to the particular optical properties of amorphous carbon films, namely, the 180° phase change for transmittance values near 10% at certain deep UV wavelengths that are used in photolithography for the manufacture of integrated circuits, phase-shift masks (used to compensate for the effects of diffraction in order to print features smaller than the exposure wavelength) made from such films are currently being developed. Such films are also being developed for use as variable transmission apertures, which can be used to greatly enhance the process latitude of DUV lithography tools. See, for example, R. A. Cirelli, M. Mkrtchyn, G. P. Watson, L. E. Trimble, G. R. Weber, D. L. Windt, and O. Nalamasu, Proc. SPIE 3334, (1998).
    
16. See http://www.lucent.com/SCALPEL for a complete bibliography of papers describing SCALPEL technology.
    

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Citing Articles

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3. Intermixing effects in ultrathin barrier magnetic tunneling junctions
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4. Performance of a double-multilayer monochromator at Beamline 2-BM at the Advanced Photon Source
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5. Structural, morphological, and mechanical properties of plasma deposited hydrogenated amorphous carbon thin films: Ar gas dilution effects
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8. Ar dilution effects on the elastic properties of hydrogenated amorphous hard-carbon films grown by plasma-enhanced chemical vapor deposition
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9. Growth, structure, and performance of depth-graded W/Si multilayers for hard x-ray optics
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10. Stress, microstructure, and stability of Mo/Si, W/Si, and Mo/C multilayer films
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11. Nondestructive characterization of thin silicides using x-ray reflectivity
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12. Use of x-ray reflectivity techniques to determine structural parameters of some silicide structures for microelectronics applications
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13. Low-stress W/Cr films for SCALPEL^® mask scattering layers
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14. Periodic and depth-graded Cu/Si multilayer films for hard x-ray optics
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15. Amorphous carbon films for use as both variable-transmission apertures and attenuated phase shift masks for deep ultraviolet lithography
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