PII: S0304-8853(97)01007-X
Electric transport properties of epitaxial Fe and Cr films with very low intralayer scattering C. D. Potterd, b, P. Beliënc, b, R. Schadb, a, *, G. Verbanckb, K. Temstb, V. V. Moshchalkovb and Y. Bruynseraedeb a Research Institute for Materials, Katholieke Universiteit Nijmegen, Toernooiveld 1 NL 6525 ED Nijmegen Netherlandsb Laboratorium voor Vaste-Stoffysika en Magnetisme, K.U. Leuven, Celestijnenlaan 200 D B-3001 Leuven Belgiumc Philips Research Labs, Prof. Holstlaan 4 NL 5656 AA Eindhoven Netherlandsd Argonne National Lab, 9700 S. Cass Ave Argonne, IL 60439 United States Received 14 July 1997. Available online 18 June 1998.
C. D. Potterd, b, P. Beliënc, b, R. Schadb, a, *, G. Verbanckb, K. Temstb, V. V. Moshchalkovb and Y. Bruynseraedeb
The low-temperature transport properties of epitaxial Fe and Cr films grown on MgO(1 0 0) substrates by molecular beam epitaxy are characterised by extremely low intralayer resistivities, indicating a very small concentration of defects. This makes such films particularly suitable for studies of the influence of the interface scattering on the transport properties of Fe/Cr superlattices.
Author Keywords: Electron transport; Thin films; Thickness dependence; Electron scattering; Giant magnetoresistance
*Corresponding author.
Send feedback to ScienceDirectSoftware and compilation © 2002 ScienceDirect. All rights reserved.ScienceDirect® is an Elsevier Science B.V. registered trademark.