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Journal of Applied Physics -- August 15, 1998 -- Volume 84, Issue 4, pp. 1881-1888

Study of interfaces in Co/Cu multilayers by low-angle anomalous x-ray diffraction

A. de Bernabé

Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, 28049 Cantoblanco, Spain
European Synchrotron Radiation Facility, B.P. 220, 38043 Grenoble, France

M. J. Capitán

European Synchrotron Radiation Facility, B.P. 220, 38043 Grenoble, France

H. E. Fischer

Institut Max von Laue-Paul Langevin, B.P. 156, 38042 Grenoble, France

C. Prieto

Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, 28049 Cantoblanco, Spain

(Received 19 February 1998; accepted 5 May 1998)

The innovative method of combining specular and off-specular low-angle x-ray diffraction, along with the anomalous scattering effect, has been used to characterize magnetron-sputtered Co/Cu multilayers. The anomalous dispersion of Co is employed to increase the electron density contrast between the cobalt and copper layer. The use of a simulation program has been proven to be a straightforward and reliable method to analyze x-ray low-angle diffraction patterns in such a nonperfectly ordered metallic multilayer system. This method has been successfully applied to data obtained from synchrotron experiments and the results compared with those performed using a standard laboratory diffractometer. The combination of both specular and off-specular scans has ensured the obtention of a single set of simulation parameters for the structure of the multilayer and its interfaces. In addition, the off-specular scans have permitted us to confirm, in a rather complex system, the validity of the distorted wave born approximation. The mesoscopic structure of this multilayered system has been accurately and self-consistently characterized. ©1998 American Institute of Physics.

PII: S0021-8979(98)00816-0
doi:10.1063/1.368315
PACS: 75.70.Cn, 68.35.Ct, 73.20.At, 81.15.Cd        Additional Information

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Citing Articles

1. The effect of microstructure on the temperature dependence of the interlayer coupling in Co/Cu multilayers
   C. Christides, J. Appl. Phys. 88, 3552 (2000)
2. Electron density fluctuations at interfaces in Nb/Si bilayer, trilayer, and multilayer films: An x-ray reflectivity study
   N. Suresh et al., J. Appl. Phys. 87, 7946 (2000)

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