PT Journal
AU Postava, K
   Bobo, JF
   Ortega, MD
   Raquet, B
   Jaffres, H
   Snoeck, E
   Gorian, M
   Fert, AR
   Redoules, JP
   Pistora, J
   Ousset, JC
TI Magneto-optical measurements of magnetization reversal in
   nanometer scale sputtered Fe thin films
SO JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
AB We present a magneto-optical study of the magnetic behavior of
   sputtered iron films of various thickness ranging from 2 to 50
   nm grown on a silicon substrate. First we calculate the
   reflection coefficients in the case of an homogeneous magneto-
   optical layer with in-plane magnetization. Then we describe a
   technique in which both in-plane magnetization components are
   detected. Because of the axial deposition procedure, iron films
   exhibit in-plane uniaxial anisotropy depending on the thickness
   of the layer. In particular, we show that, for 4 nm thickness,
   anistropy induced by slightly tilted columnar growth can be
   observed, whereas for larger thicknesses this in-plane
   anisotropy vanishes. Using an accurate acquisition system based
   upon a rapid analog-to-digital converter we measured the rapid
   magnetization reversal. The field sweep rate was varied between
   100 Oe/s and 1 MOe/s. We interpret the observed dynamical
   effects in terms of wall movement and microdomain reversal.
TC 9
BP 8
EP 20
PG 13
JI J. Magn. Magn. Mater.
PY 1996
PD OCT
VL 163
IS 1-2
GA VW289
J9 J MAGN MAGN MATER
UT ISI:A1996VW28900003
ER