0039-6028(96)00772-8
Surface morphology development during ion sputtering. Roughening or smoothing? M. Menyhardb, *, G. Gergelyb, Z. Csahoka, Z. Farkasa and Cs. S. Daroczic a Department of Atomic Physics, Eötvös University, Puskin u. 5-7 H-1088 Budapest Hungaryb Resesarch Institute for Technical Physics HAS, POB 76 H-1325 Budapest Hungaryc KFKI, Material Research Institute HAS, POB 49 H-1525 Budapest Hungary Received 19 February 1996; accepted 25 April 1996. Available online 9 February 1999.
M. Menyhardb, *, G. Gergelyb, Z. Csahoka, Z. Farkasa and Cs. S. Daroczic
We report on STM studies of ion-sputtered surfaces, applying sputtering conditions which were shown to produce a relatively smooth surface. The height correlation function was calculated for the nickel layer in both the as-received and sputtered conditions. The large-scale roughness of the as-received specimen was reduced by ion sputtering according to expectations derived from Auger depth profiling. On the other hand, the small-scale roughness was increased due to sputtering. Self-affine scaling regions are identified, and the exponents are compared to theoretical and numerical results.
Author Keywords: Ion bombardment; Ion-solid interaction; Surface structure, morphology, roughness and topography
*Corresponding author.
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