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Phys. Rev. B 53, R8824–R8827 (1996)

[Issue 14 – 1 April 1996 ]

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Soft-x-ray fluorescence study of buried silicides in antiferromagnetically coupled Fe/Si multilayers

J. A. Carlisle, A. Chaiken, R. P. Michel, and L. J. Terminello

Materials Science and Technology Division, Lawrence Livermore National Laboratory, Livermore, California 94551

J. J. Jia and T. A. Callcott

University of Tennessee, Knoxville, Tennessee 37996

D. L. Ederer

Tulane University, New Orleans, Louisiana 70118

Soft-x-ray fluorescence spectroscopy has been employed to obtain information about the Si-derived valence-band states of Fe/Si multilayers. The valence-band spectra are quite different for films with and without antiferromagnetic interlayer exchange coupling, demonstrating that these multilayers have different silicide phases in their spacer layers. Comparison with previously published fluorescence data on bulk iron silicides shows that the Fe concentration in the silicide spacer layers is substantial. Near-edge x-ray-absorption data on antiferromagnetically coupled multilayers in combination with the fluorescence data demonstrate unambiguously that the silicide spacer layer in these films is metallic. These results on the electronic structure of buried layers in a multilayer film exemplify the wide range of experiments made possible by high-brightness synchrotron sources.

©1996 The American Physical Society

URL: http://link.aps.org/abstract/PRB/v53/pR8824
DOI: 10.1103/PhysRevB.53.R8824
PACS: 75.50.Bb, 78.70.En, 61.10.Ht, 68.65.+g

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