JMMM 121 (1993) 436-439

The effect of roughness on the magnetoresistance of Fe/Cr multilayers

N.M. Rensing, A.P. Payne and B.M. Clemens

We investigated magnetoresistance in wedged Fe/Cr multilayers grown at 
several sputtering pressure. Low angle X-ray scattering showed that 
interface roughness increased with higher sputtering pressure. The 
increased roughness was accompanied by an increase in saturation 
resistance, which results in a decrease in fractional magnetoresistance. 
The maximum magnetoresistance (measured at room temperature) was 7.3 and 
4.0% for the films grown at 1.4 and 10mT Ar, respectively, both at the 
region with 13 angstrom Cr layers.