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Phys. Rev. B 48, 17432–17444 (1993)

[Issue 23 – 15 December 1993 ]

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Interfacial roughness of sputtered multilayers: Nb/Si

Eric E. Fullerton, J. Pearson, C. H. Sowers, and S. D. Bader

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439

X. Z. Wu and S. K. Sinha

Exxon Research and Engineering Company, Annandale, New Jersey 08801

We have carried out studies of the interfacial roughness of a number of Nb/a-Si multilayers using cross-section transmission electron microscopy, wide-angle x-ray diffraction, and low-angle x-ray reflectivity and diffuse scattering. The multilayers studied were grown by sputtering in an Ar atmosphere at various pressures. The effect of the layer thickness and of the number of layers has also been studied. We observed a clear transition in the growth morphology when the sputtering pressure is raised above the thermalization pressure ( [approx equals] 9 mTorr) of the sputtered atoms. Both the mosaic of the Nb crystallites and the interface roughness increase dramatically when the Ar pressure exceeds 9 mTorr. The roughness of the various interfaces is strongly conformal and the samples with large roughness show a roughness that increases with deposited layer number. We discuss the quantitative extraction of these parameters from the x-ray data and the implications of these results for the physics of the deposition process.

©1993 The American Physical Society

URL: http://link.aps.org/abstract/PRB/v48/p17432
DOI: 10.1103/PhysRevB.48.17432
PACS: 61.10.-i, 68.55.Jk

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References

1. Physics, Fabrication, and Applications of Multilayered Structures, edited by P. Dhez and C. Weisbuch (Plenum, New York, 1988).
2. See various articles in Kinetics of Ordering and Growth at Surfaces, edited by Max G. Lagally (Plenum, New York, 1990).
3. B. M. Clemens and R. Sinclair, MRS Bull. 15, 19 (1990) [ INSPEC].
4. F. Family, Physcia A 168, 561 (1990).
5. M. Kardar, G. Parisi and Y. Zhang, Phys. Rev. Lett. 56, 889 (1986) [SPIRES].
6. H. Yan, Phys. Rev. Lett. 68, 3048 (1992).
7. S. Das Sarma and P. Tamborenea, Phys. Rev. Lett. 66, 325 (1991).
8. H. You, R. P. Chiarello, H. K. Kim and K. G. Vandervoort, Phys. Rev. Lett. 70, 2900 (1993).
9. Y.-L. He, H.-N. Yang, T.-M. Lu and G.-C. Wang, Phys. Rev. Lett. 69, 3770 (1992).
10. J. Chevrier, V. Le Thanh, R. Buys and J. Derrien, Europhys. Lett. 16, 737 (1991) [ INSPEC].
11. A. Duparré, J. Mod. Opt. 38, 2413 (1991) [ INSPEC].
12. C. Tang, S. Alexander and R. Bruinsma, Phys. Rev. Lett. 64, 772 (1990) [SPIRES].
13. A. Mazor, D. J. Srolovitz, P. S. Hagan and B. G. Bukiet, Phys. Rev. Lett. 60, 424 (1988).
14. J. M. Thijssen, H. J. F. Knops and A. J. Dammers, Phys. Rev. B 45, 8650 (1992).
15. R. A. Roy and R. Messier, in Plasma Synthesis and Etching of Electronic Materials, edited by R. P. H. Chang and B. Abeles, MRS Symposia Proceedings No. 38 (Materials Research Society, Pittsburgh, 1985), p. 363.
16. G. L. M. K. S. Kahanda, X. Zou, R. Farrell and P. Wong, Phys. Rev. Lett. 68, 3741 (1992).
17. D. J. Miller, K. E. Gray, R. T. Kampwirth and J. M. Murduck, Europhys. Lett. 19, 27 (1992) [ INSPEC].
18. E. E. Fullerton, D. M. Kelly, J. Guimpel, I. K. Schuller and Y. Bruynseraede, Phys. Rev. Lett. 68, 859 (1992).
19. D. E. Savage, N. Schimke, Y.-H. Phang and M. G. Lagally, J. Appl. Phys. 71, 3283 (1992) [ INSPEC].
20. Ph. Houdy, P. Boher, C. Schiller, P. Luzeau, R. Barchewitz, N. Alehyane and M. Quahabi, Proc. SPIE 984, 95 (1988).
21. D. G. Stearns, J. Appl. Phys. 71, 4286 (1992) [ INSPEC].
22. For a general discussion see H. Windischmann, CRC Crit. Rev. Solid State Mater. Sci. 17, 547 (1992), and references therein [ INSPEC].
23. J. E. Mattson, M. E. Brubaker, C. H. Sowers, M. Conover, Z. Qui and S. D. Bader, Phys. Rev. B 44, 9378 (1991).
24. E. E. Fullerton, I. K. Schuller, H. Vanderstraeten and Y. Bruynseraede, Phys. Rev. B 45, 9292 (1992).
25. D. G. Stearns, R. S. Rosen and S. P. Vernon, J. Vac. Sci. Technol. A 9, 2662 (1991) [ INSPEC].
26. D. L. Windt, R. Hull and W. K. Waskiewicz, J. Appl. Phys. 71, 2675 (1992) [ INSPEC].
27. B. M. Clemens, J. Appl. Phys. 61, 4525 (1987) [ SPIN][ INSPEC].
28. J. M. Slaughter, P. A. Kearney, D. W. Schulze, C. M. Falco, C. R. Hills, E. B. Saloman and R. N. Watts, Proc. SPIE 1343, 73 (1990).
29. K. Holloway, K. B. Do and R. Sinclair, J. Appl. Phys. 65, 474 (1989) [ SPIN][ INSPEC].
30. D. G. Stearns, M. B. Stearns, Y. Cheng, J. H. Stith and N. M. Cegilio, J. Appl. Phys. 67, 2415 (1990) [ SPIN][ INSPEC].
31. A. K. Petford-Long, M. B. Stearns, C.-H. Chang, S. R. Nutt, D. G. Stearns, N. M. Ceglio and A. M. Hawryluk, J. Appl. Phys. 61, 1422 (1987) [ SPIN][ INSPEC].
32. D. L. Windt, R. Hull, W. K. Waskiewicz and J. B. Kortright, Proc. SPIE 1343, 292 (1990).
33. See, for example, T. D. Nguyen, R. Gronsky and J. B. Kortright, J. Electron Microsc. Tech. 19, 473 (1991); W. C. Shih and W. M. Stobbs, Ultramicroscopy 35, 197 (1991) [ INSPEC].
34. Y. Ijdiyaou, M. Azizan, E. L. Ameziane, M. Brunel, and T. A. Nguyen Tan, Appl. Surf. Sci. 55, 165 (1992).
35. B. Heidemann, T. Tappe, B. Schmiedeskamp and U. Heinzmann, Thin Solid Films 228, 60 (1993) [ INSPEC].
36. A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, B. Schmiedeskamp and U. Heinzmann, Thin Solid Films 228, 154 (1993) [ INSPEC].
37. W. Sevenhans, M. Gijs, Y. Bruynseraede, H. Homma and I. K. Schuller, Phys. Rev. B 34, 5955 (1986).
38. S. K. Sinha, Physica B 173, 25 (1991) [ INSPEC].
39. A. P. Payne and B. M. Clemens, Phys. Rev. B 47, 2289 (1993).
40. D. E. Savage, J. Kleiner, N. Schimke, Y.-H. Phang, T. Jankowski, J. Jacobs, R. Kariotis and M. G. Lagally, J. Appl. Phys. 69, 1411 (1991) [ INSPEC].
41. M. K. Sanyal, S. K. Sinha, A. Gibaud, S. K. Satija, C. F. Majkrzak, and H. Homma, in Interface Dynamics and Growth, edited by K. S. Liang, MRS Symposia Proceedings No. 237 (Materials Research Society, Pittsburgh, 1992), p. 393.
42. Y. H. Phang, D. E. Savage, T. F. Kuech, M. G. Lagally, J. S. Park and K. L. Wang, Appl. Phys. Lett. 60, 2986 (1992) [ INSPEC].
43. S. K. Sinha, E. B. Sirota, S. Garoff and H. B. Stanley, Phys. Rev. B 38, 2297 (1988).
44. E. E. Fullerton, J. Pearson, C. H. Sowers, S. D. Bader, M. K. Sanyal, X. Z. Wu, and S. K. Sinha (unpublished).
45. Y. H. Phang, R. Kariotis, D. E. Savage and M. G. Lagally, J. Appl. Phys. 72, 4627 (1992) [ INSPEC].
46. L. G. Parratt, Phys. Rev. 95, 359 (1954). .
47. P. F. Miceli, C. J. Palmstøm and K. W. Moyers, App Phys. Lett. 61, 2060 (1992) [ INSPEC].
48. D. G. Stearns, Appl. Phys. Lett. 62, 1745 (1993) [ INSPEC].
49. E. Spiller, Appl. Phys. Lett. 54, 2293 (1989) [ SPIN][ INSPEC]; Opt. Eng. 29, 609 (1990) [ INSPEC].
50. R. D. Bland, G. J. Kominiak and D. M. Mattox, J. Vac. Sci. Technol. 11, 671 (1974) [ SPIN][ INSPEC].
51. R. P. U. Karunasiri, R. Bruinsma and J. Rudnick, Phys. Rev. Lett. 62, 788 (1989).
52. Y. Huai, R. W. Cochrane and M. Sutton, Phys. Rev. B 48, 2568 (1993).
53. C. V. Thompson, L. A. Clevenger, R. DeAvillez, E. Ma, and H. Miura, in Thin Film Structures and Phase Stability, edited by B. M. Clemens and W. L. Johnson, MRS Symposia Proceedings No. 187 (Materials Research Society, Pittsburgh, 1990), p. 61.
54. E. E. Fullerton, J. E. Mattson, S. R. Lee, C. H. Sowers, Y. Y. Huang, G. Felcher, S. D. Bader and F. T. Parker, J. Magn. Magn. Mater. 117, L301 (1992) [ INSPEC].
55. E. E. Fullerton, J. E. Mattson, S. R. Lee, C. H. Sowers, Y. Y. Huang, G. Felcher, S. D. Bader and F. T. Parker, J. Appl. Phys. 73, 6335 (1993) [ INSPEC].
56. R. Pretorius, Vacuum 41, 1038 (1990) [ INSPEC].
57. J. M. Slaughter, A. Shapiro, P. A. Kearney and C. M. Falco, Phys. Rev. B 44, 3854 (1991).
58. E. E. Fullerton, M. Grimsditch, and I. K. Schuller (unpublished).
59. K. Takanashi, Y. Obi, Y. Mitani and H. Fujimori, J. Phys. Soc. Jpn. 61, 1169 (1992) [ INSPEC].
60. F. Petroff, A. Barthélémy, A. Hamzié, A. Fert, P. Etienne, S. Lequien and G. Greuzet, J. Magn. Magn. Mater. 93, 95 (1991) [ INSPEC].
61. S. S. P. Parkin and B. R. York, Appl. Phys. Lett. 62, 1842 (1993) [ INSPEC].
62. D. M. Kelly, E. E. Fullerton, F. T. Parker, J. Guimpel, Y. Bruynseraede and I. K. Schuller, Int. J. Mod. Phys. B 7, 419 (1992) [ INSPEC].

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