Journal of Magnetism and Magnetic Materials
Volumes 242-245, Part 1,
April 2002,
Pages 352-354
DOI:
10.1016/S0304-8853(01)01157-X
PII: S0304-8853(01)01157-X
Copyright © 2002 Elsevier Science B.V. All rights reserved.
Study of in-plane magnetic anisotropy in Co-based thin-film media
R. Murao
, 
, C. Okuyama, K. Takahashi, A. Kikuchi, Y. Kitamoto and S. Ishida
Yamagata Fujitsu Ltd., Ko 5400-2, Higashine Higashine-City, Yamagata 999-3701, Japan
Available online 14 December 2001.
Abstract
The relationship among macroscopic in-plane magnetic anisotropy, the crystal structure of both the Co-based magnetic layer and the Cr under-layer, and the surface morphology of the textured substrate was studied. In the highly oriented media, the preferred orientation of the c-axis of Co to the circumferential direction and the distortion of the Cr crystal lattice were observed. In-plane magnetic anisotropy is induced when the grain of the under-layer is smaller than the texture grooves.
Author Keywords: Magnetic recording media; Crystal structure; Anisotropy induced; X-ray diffraction
Article Outline
- 1. Introduction
- 2. Experimental method
- 3. Results and discussion
- 4. Summary
- References
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Fig. 1. Dependence of Cr layer thickness on HC and HC orientation (HCcir/HCrad).
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Fig. 2. Co(0 0 2) intensity ratio (ICo(002)cir/ICo(002)rad) dependence on HC orientation ratio (HCcir/HCrad).
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Fig. 3. Cr(1 1 0) interplanar spacing ratio dependence on ICo(002)cir/ICo(002)rad.
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Fig. 4. Cr(1 1 0) interplanar spacing ratio and HCcir/HCrad as a function of the ratio of grain diameter and groove half-width L0.
References
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2. K.E. Johnson, M. Mirzamaani and M.F. Doerner IEEE Trans. Mgn. 31 (1995), p. 2721. Abstract-Compendex
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3. C.A. Ross, M.E. Schabes, R. Ranjan, G. Bertero and T. Chen J. Appl. Phys. 79 (1996), p. 5342. Abstract-INSPEC
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4. D.N. Lambeth, W. Yang, H. Gong, D.E. Laughlin, B. Lu, L.-L. Lee, J. Zou and P.S. Harllee Mat. Res. Soc. Symp. Proc. 517 (1998), p. 181. Abstract-Compendex
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Corresponding author. Tel.: +81-237-43-8250; fax: +81-237-43-7149; email: murao@yfl.fujitsu.com
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