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Journal of Applied Physics -- January 15, 2001 -- Volume 89, Issue 2, pp. 1101-1107

Nonspecular x-ray reflectivity study of roughness scaling in Si/Mo multilayers

J. M. Freitag and B. M. Clemens

Department of Materials Science and Engineering, Stanford University, Stanford, California 94305-2205

(Received 10 July 2000; accepted 17 October 2000)

The interfacial roughness and lateral correlation length of a series of Si/Mo multilayers with bilayer period 69 Å and number of bilayers ranging from 5 to 40 have been characterized by diffuse x-ray scattering. Superlattice peaks are preserved in offset radial scans indicating a high degree of conformality in the roughness. The lateral correlation length increases with total film thickness h as ~h^0.55; however, the magnitude of the roughness is approximately 2 Å for all film thicknesses, in disagreement with scaling laws for self-affine growing surfaces. This observation suggests that interfaces retard the evolution of high-frequency roughness while replicating longer wavelength roughness from one layer to the next ©2001 American Institute of Physics.

doi:10.1063/1.1332095
PACS: 68.65.Ac, 68.65.Cd, 78.70.Ck        Additional Information

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Citing Articles

1. Interface roughness correlation due to changing layer period in Pt/C multilayers
   Amitesh Paul et al., Phys. Rev. B 65, 245416 (2002)

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